Optimized Utilization of Dual Magnetron Setups

Optimized Utilization of Dual Magnetron Setups

Holm Geissler
VON ARDENNE GmbH

Today’s large scale roll-to-roll coaters provide a productivity that may exceed the demand for a single product. The capability to run multiple layer stack systems for different products and applications on a coater without large efforts for reconfiguration is desired. Regular dual magnetrons for either DC or AC modes use different arrangements, e.g. in tube-to-tube distance and existence of anodes. Change between the modes may require extended down time of the coater. In order to deposit either metals or dielectric materials with the same magnetron setup, new methods like bipolar power supplies offer new options. In this paper, these methods will be reviewed and compared with conventional AC and DC sputtering. Results for deposited films of metals, TCO’s and oxides will be compared. Our recent results will open up new opportunities for optimized configurations and more compact design of roll-to-roll coating systems.